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京东 11.11 红包
[Logic Device Part1] High-k Metal Gate HKMG
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https://www.youtube.com/watch?v=l9VwY0aN5uY&t=2s 该视频脚本介绍了高K金属栅极技术在半导体制造中的重要性,以及金属栅极对晶体管性能的影响。讨论了栅极电容的影响和金属合金的稳定性。还提到了多阈值电压实施和Gate Last工艺的优势。最后,介绍了通过3D器件结构克服Boltzmann极限的方法,以提高半导体器件的性能和效率。
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