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[SPIE] High performance MOCVD for micro LED applications
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https://doi.org/10.1117/12.2578842 Veeco MOCVD solutions are capable of supporting multiple substrates (GaAs, InP, sapphire, Si), and offer seamless transition to larger substrate sizes. For 6” GaAs red micro LED, Lumina® has demonstrated total population wavelength yield of >95% in 3 nm bin with defectivity <0.5 / cm2 @ >2um and 25% higher throughput than other platforms. For 6” sapphire miniLED, EPIK® has demonstrated within wafer wavelength 1sigma uniformity of 0.68nm (blue) / 1.24nm (green). For microLED on 200mm and 300mm silicon, Veeco has developed Propel® single wafer reactor for best in-class uniformity. Details of the technology and current data will be discussed. COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only. Citation Download Citation Ronald A. Arif, Soo Min Lee, Drew Hanser, Mark McKee, Eric Armour, Bumjoon Kim, Ajit Paranjpe, Bojan Mitrovic, and Terry Toh "High performance MOCVD for micro LED applications", Proc. SPIE 11706, Light-Emitting Devices, Materials, and Applications XXV, 1170613 (5 March 2021); https://doi.org/10.1117/12.2578842
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